I800W

For Semiconduct PECVD and HDPCVD Processes

NANOPURE® I800W是专为半导体工序特别开发的产品。
NANOPURE® I800W是为最大限度减少高温下因NF3等离子侵蚀,导致微粒生成而设计。特别是在氟及氧系等离子环境下具有较低的蚀刻率和优异的机械强度。
NANOPURE® I800W最高可在320℃环境下使用。

Features & Benefit

  • Excellent mechanical strength properties
  • Excellent resistance to ‘dry’ gas process environments
  • Very low weight loss in reactive plasmas
  • Excellent (low) compression set properties
  • Excellent elastic recovery properties

Suggested Applications

  • Chamber lid seals
  • Gas inlet seals
  • Quartz window seals
  • Other thermal applications
  • Other plasma applications

Typical Physical Properties

Color White
Polymer Type Perfluoroelastomer
Hardness1), Shore A 76
Tensile Strength at Break2), MPa 12.0
Elongation at Break3), % 250
100% Modulus4), MPa 5.0
Compression Set5), %
70 hours @ 204℃ 17
70 hours @ 250℃ 25
70 hours @ 300℃ 49
70 hours @ 325℃  
Maximum Continuous Service,
Temperature, ℃
320
  1. ASTM D1415 (ISO 48)
  2. ASTM D412 (ISO 37)
  3. ASTM D412 (ISO 37)
  4. ASTM D412 (ISO 37)
  5. ASTM D395 Method B ; (ISO 815)

推荐使用工序

需要高度耐热的等离子工序



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