1075

1075 Chemical resistance & Microwave Plasma Process
Resistance to chemicals with Microwave Etching and medium density CVD plasma process

NANOPURE ® 1075 Feature

1075, developed for general use and low price, is a cost-effective product with superb CF4 and O2 plasma resistance. NANOPURE® 1075 is suitable for Chemical, Microwave Etching and Medium-density Plasma CVD process.

NANOPURE® #1075 which Popular and economy Version with combined CF4,O2 plasma resistance and Resistance to chemicals. *Application of semiconductor (Microwave etching plasma and medium density CVD processing)  

Typical Physical Propertise
Color White
Polymer Type Perfluoroelastomer
Specific Gravity 2.02
Hardness (Shore A) 78
Tensile Strength (Mpa) 18.0
Elongation (%) 160
Modulus 100% (Mpa) 12.0
Compression Set(%) 70hrs @ 200℃ 15
Service Temperature Range -20℃ to 250℃


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