Plasma resistance and high friction resistance among VITON group

For Semiconduct PECVD and HDPCVD Processes

NANOPURE ® EAO-75S is a drastically improved product in wear resistance and chemical resistance compared to the existing FKM.
Due to its superb wear resistance, NANOPURE® EAO-75S minimizes problems caused by mechanical damage, prolongs a seal’s lifespan and provides high process yield. In addition, NANOPURE® EAO-75S has superb compression restoration rate and outstanding resistance to low plasma environment.
NANOPURE® EAO-75S is usable up to 260°C.

Features & Benefit

  • Excellent abrasion resistance
  • Minimal contamination due to seal degradation or metallic ion content
  • Extends in-use seal life between preventive maintenance cycles
  • Excellent physical properties
  • Low compression set

Suggested Applications

  • Endpoint windows
  • Valve seals
  • Fitting seals
  • Windows seals
  • Lid seals
  • Gas inlet seals
  • Slit valve seals
  • Chamber seals

Typical Physical Properties

Color Black
Polymer Type Perfluoroelastomer
Hardness1), Shore A 74
Tensile Strength at Break2), MPa 21.6
Elongation at Break3), % 230
100% Modulus4), MPa 5.4
Compression Set5), %
70 hours @ 204℃ 16
70 hours @ 250℃  
70 hours @ 300℃  
70 hours @ 325℃  
Maximum Continuous Service,
Temperature, ℃
  1. ASTM D1415 (ISO 48)
  2. ASTM D412 (ISO 37)
  3. ASTM D412 (ISO 37)
  4. ASTM D412 (ISO 37)
  5. ASTM D395 Method B ; (ISO 815)

Recommended Use of process

Process that requires resistance to drive and friction like SPUTTER and so on


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